It is presently reported new results to correct and to modify some parts of previous books Plasmas Afterglows with N2 for Surface Treatments, editions 1-3, published by Bookpi – editions in 2021,2022 and 2023.
In a first chapter, these new results concern the production of plasma active species with N\(_2\) which contain dissociated atoms or radicals. They mainly introduce changes of the N+N+M(N\(_2\),Ar,He) recombination rates after the H-atoms density recently measured by a Two Photon Laser Induced Fluorescence ( TALIF) diagnostics in the Toulouse Laplace Lab. It follows changes of H and NH densities in the afterglows of N\(_2\) and Ar-N\(_2\) microwave discharges.
In a second chapter, plasmas maintained by microwave fields were reconsidered from the previous Chapter 8 (Bookpi edition 1 – 2021) showing that they are due to surface waves. Several microwave plasmas sources are described from low pressure Ar plasmas: surfatron and surfaguide cavity up to atmospheric gas pressure Ar plasmas as TIA/TIAGO torches.
